Publications

Found 3 results
Filters: Author is Nelson, J. S.  [Clear All Filters]
1998
S. Zhao and Kimerling, L. C., Defect reactions induced by reactive ion etching, in Semiconductor Process and Device Performance Modelling, vol. 490, S. T. Dunham and Nelson, J. S. 1998, pp. 123 - 128.
S. P. Riege, Andleigh, V., Thompson, C. V., and Frost, H. J., Modeling of grain structure evolution and its impact on the reliability of Al(Cu) thin film interconnects, in Semiconductor Process and Device Performance Modelling, vol. 490, S. T. Dunham and Nelson, J. S. 1998, pp. 219 - 224.