|Title||Lanthanum nickelate thin films deposited by spray pyrolysis: Crystallization, microstructure and electrochemical properties|
|Publication Type||Journal Article|
|Year of Publication||2012|
|Authors||Ryll, T, Reibisch, P, Schlagenhauf, L, Bieberle-Huetter, A, Doebeli, M, Rupp, JLM, Gauckler, LJ|
|Journal||Journal of the European Ceramic Society|
|Pagination||1701 - 1709|
Thin films from the Lan+1NinO3n+1 system exhibit favorable dielectric and electrochemical properties that may prove useful for a variety of devices ranging from ferroelectrics to low-temperature solid oxide fuel cells. The present work covers the compositional, microstructural and electrochemical characterization of thin lanthanum nickelate films deposited by spray pyrolysis. In accordance with the phase diagram, LaNiO3-delta or La4Ni3O10-delta films were obtained during annealing of spray deposited films at temperatures between 540 degrees C and 1100 degrees C. Whereas LaNiO3-delta films exhibited a high metallic conductivity, La4Ni3O10-delta films were semiconducting. Electrochemical impedance spectroscopy indicated an increase of the area specific oxygen reduction resistance with the annealing temperature. The study highlights how the phase and microstructure of thin films from the Lan+1NinO3n+1 system can be tailored by annealing of initially amorphous films. LaNiO3-delta films have a high potential for application in electrochemical devices operating at low temperatures where high electrical conductivity is required. (C) 2012 Elsevier Ltd. All rights reserved.