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J. L. BENTON, WEIR, B. E., EAGLESHAM, D. J., GOTTSCHO, R. A., Michel, J., and Kimerling, L. C., MEASUREMENT OF DEFECT PROFILES IN REACTIVE ION ETCHED SILICON, Journal of Vacuum Science & Technology B, vol. 10, no. 1, pp. 540 - 543, 1992.