Publications

Found 2 results
Filters: Author is Marathe, Amit P.  [Clear All Filters]
2008
F. L. Wei, Hau-Riege, C. S., Marathe, A. P., and Thompson, C. V., “Effects of active atomic sinks and reservoirs on the reliability of Cu/low-k interconnects”, Journal of Applied Physics, vol. 103, no. 8, 2008.
F. L. Wei, Gan, C. Lip, Tan, T. Lyn, Hau-Riege, C. S., Marathe, A. P., Vlassak, J. J., and Thompson, C. V., “Electromigration-induced extrusion failures in Cu/low-k interconnects”, Journal of Applied Physics, vol. 104, no. 2, 2008.