Publications

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1992
J. L. BENTON, WEIR, B. E., EAGLESHAM, D. J., GOTTSCHO, R. A., Michel, J., and Kimerling, L. C., MEASUREMENT OF DEFECT PROFILES IN REACTIVE ION ETCHED SILICON, Journal of Vacuum Science & Technology B, vol. 10, no. 1, pp. 540 - 543, 1992.