Publications

Found 2 results
Filters: Author is Hwang, N.  [Clear All Filters]
2006
C. W. Chang, Choi, Z. S., Thompson, C. V., Gan, C. L., Choi, W. K., and Hwang, N., “Electromigration resistance in a short three-contact interconnect tree”, Journal of Applied Physics, vol. 99, no. 9, 2006.
2004
C. W. Chang, Gan, C. L., Thompson, C. V., Pey, K. L., Choi, W. K., and Hwang, N., “Mortality dependence of Cu dual damascene interconnects on adjacent segment”, in Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics-2004, vol. 812, R. J. Carter, HauRiege, C. S., Lu, T. M., and Schulz, S. E. 2004, pp. 339 - 344.