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C. W. Chang, Gan, C. L., Thompson, C. V., Pey, K. L., Choi, W. K., and Hwang, N., Mortality dependence of Cu dual damascene interconnects on adjacent segment, in Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics-2004, vol. 812, R. J. Carter, HauRiege, C. S., Lu, T. M., and Schulz, S. E. 2004, pp. 339 - 344.