Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

TitleThin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing
Publication TypeJournal Article
Year of Publication2014
AuthorsBai, W, Hannon, AF, Gotrik, KW, Choi, HKyoon, Aissou, K, Liontos, G, Ntetsikas, K, Alexander-Katz, A, Avgeropoulos, A, Ross, CA
JournalMacromolecules
Volume47
Issue17
Pagination6000 - 6008
Date Published2014/09/09/
Abstract

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.