Tensile strained epitaxial Ge films on Si(100) substrates with potential application in L-band telecommunications

TitleTensile strained epitaxial Ge films on Si(100) substrates with potential application in L-band telecommunications
Publication TypeJournal Article
Year of Publication2004
AuthorsCannon, DD, Liu, JF, Ishikawa, Y, Wada, K, Danielson, DT, Jongthammanurak, S, Michel, J, Kimerling, LC
JournalApplied Physics Letters
Volume84
Issue6
Pagination906 - 908
Date Published2004/02/09/
ISBN Number0003-6951