Stress development and relaxation during reactive film formation of Ni2Si

TitleStress development and relaxation during reactive film formation of Ni2Si
Publication TypeJournal Article
Year of Publication2004
AuthorsLiew, KP, Bernstein, RA, Thompson, CV
JournalJournal of Materials Research
Volume19
Issue2
Pagination676 - 680
Date Published2004/02//
ISBN Number0884-2914