Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects

TitleSimulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects
Publication TypeJournal Article
Year of Publication1999
AuthorsPark, YJ, Andleigh, VK, Thompson, CV
JournalJournal of Applied Physics
Volume85
Issue7
Pagination3546 - 3555
Date Published1999/04/01/
ISBN Number0021-8979