Reliability computer-aided design tool for full-chip electromigration analysis and comparison with different interconnect metallizations

TitleReliability computer-aided design tool for full-chip electromigration analysis and comparison with different interconnect metallizations
Publication TypeJournal Article
Year of Publication2007
AuthorsAlam, SM, Gan, CLip, Thompson, CV, Troxel, DE
JournalMicroelectronics Journal
Volume38
Issue4-5
Pagination463 - 473
Date Published2007/05//APR
ISBN Number0026-2692