Title | Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25nm wide magnetic wires |
Publication Type | Journal Article |
Year of Publication | 2014 |
Authors | Currivan, JAnne, Siddiqui, S, Ahn, S, Tryputen, L, Beach, GSD, Baldo, MA, Ross, CA |
Journal | Journal of Vacuum Science & Technology B |
Volume | 32 |
Issue | 2 |
Date Published | 2014/03// |
ISBN Number | 1071-1023 |