Ion-induced chemical vapor deposition of high purity Cu films at room temperature using a microwave discharge H atom beam source

TitleIon-induced chemical vapor deposition of high purity Cu films at room temperature using a microwave discharge H atom beam source
Publication TypeJournal Article
Year of Publication1997
AuthorsChiang, TP, Sawin, HH, Thompson, CV
JournalJournal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Volume15
Issue5
Pagination2677 - 2686
Date Published1997/10//SEP
ISBN Number0734-2101