|Title||Hierarchical Nanostructures by Sequential Self-Assembly of Styrene-Dimethylsiloxane Block Copolymers of Different Periods|
|Publication Type||Journal Article|
|Year of Publication||2011|
|Authors||Son, JGon, Hannon, AF, Gotrik, KW, Alexander-Katz, A, Ross, CA|
|Pagination||634 - +|
Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS with a 34-40 nm period, which is itself templated by micrometer-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10-nm features and registering them on the substrate.