The effect of an yttrium interlayer on a ni germanided metal gate workfunction in SiO2/HfO2

TitleThe effect of an yttrium interlayer on a ni germanided metal gate workfunction in SiO2/HfO2
Publication TypeJournal Article
Year of Publication2007
AuthorsYu, HP, Pey, KL, Choi, WK, Dawood, MK, Chew, HG, Antoniadis, DA, Fitzgerald, EA, Chi, DZ
JournalIeee Electron Device Letters
Volume28
Issue12
Pagination1098 - 1101
Date Published2007/12//
ISBN Number0741-3106