Effect of Using Chemical Vapor Deposition WSi2 and Postmetallization Annealing on GaAs Metal-Oxide-Semiconductor Capacitors

TitleEffect of Using Chemical Vapor Deposition WSi2 and Postmetallization Annealing on GaAs Metal-Oxide-Semiconductor Capacitors
Publication TypeJournal Article
Year of Publication2010
AuthorsOng, BS, Pey, KL, Ong, CY, Tan, CS, Gan, CL, Cai, H, Antoniadis, DA, Fitzgerald, EA
JournalElectrochemical and Solid State Letters
Volume13
Issue9
PaginationII328 - II331
Date Published2010///
ISBN Number1099-0062