Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25nm wide magnetic wires

TitlePolymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25nm wide magnetic wires
Publication TypeJournal Article
Year of Publication2014
AuthorsCurrivan, JAnne, Siddiqui, S, Ahn, S, Tryputen, L, Beach, GSD, Baldo, MA, Ross, CA
JournalJournal of Vacuum Science & Technology B
Volume32
Issue2
Date Published2014/03//
ISBN Number1071-1023