Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations

TitleEnhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations
Publication TypeJournal Article
Year of Publication2010
AuthorsMickiewicz, RA, Yang, JKW, Hannon, AF, Jung, Y-S, Alexander-Katz, A, Berggren, KK, Ross, CA
JournalMacromolecules
Volume43
Issue19
Pagination8290 - 8295
Date Published2010/10/12/
Abstract

Self-consistent field theory methodology is used to explore the graphoepitaxy of sphericalmorphology block copolymers templated by an array of posts, as well as to predict the formation lapel-iodic templated structures, giving an excellent agreement with experimental results. Simulations in two and three dimensions were performed on model hexagonal lattices of posts with spacing, L(post) that was varied in the range L(post) = 1.7 L(0) to 3.9 L(0), where L(0) is the equilibrium period of the block copolymer. The effects of changing the diameter of the posts and the volume fraction of the block copolymer were investigated, and the formation of a structure with designed aperiodicities was successfully modeled.